【作者(必填)】
Shigeyuki Takagi1, Katsumi Iyanagi1, Seiji Onoue1, Tadashi Shinmura1 and Makoto Fujino2
【文题(必填)】
Topography Simulation of Reactive Ion Etching Combined with Plasma Simulation, Sheath Model, and Surface Reaction Model

【年份(必填)】
2002
【全文链接或数据库名称(选填)】http://iopscience.iop.org/article/10.1143/JJAP.41.3947/meta