In the lab, researchers devised 12nm lines on a device. The space between lines varied by less than 0.5nm from a pitch of 32nm. CD-SAXS measurements of periodic pitch errors were accurate to within 0.1nm, and measurements of line shapes were accurate to about 0.2nm.
在实验室中,研究者为一台设备设计了12纳米的线。在32纳米的齿轮中,线与线之间的距离在0.5纳米以下变动。用CD-SAXS测量出来的周期性齿距差精确到0.1纳米,测量出来的线型大小精确到0.2纳米。
注:
pitch errors翻译来源:http://dict.cnki.net/h_65507000.html